Facilities

Fabrication

Electron Beam Physical Vapor Deposition

  • Base pressure 10-7 torr.
  • 4 materials in-situ
  • Mechanical masks
  • Temperature range: RT to 500 C

  • Base pressure 10-8 torr.
  • 4 materials in-situ
  • Temperature range: – 130 to 1000 C
  • Wedge (variable thickness)

Electron Beam PVD: Materials

Elemental Metals
Au, Ag, Fe, Ni, Co, Cu, Al, Ti, Nb, etc
Magnetic compounds
BCoFe, Permalloy, Supermalloy
Non-metallic compounds
FeF, Terfenol-D

Magnetron Sputtering

  • 8 sputtering guns, including a confocal cluster with three guns
  • Ar and O2 gas mix for oxide growth
  • 2 DC and 1 RF power source


Magnetron Sputtering: Materials

  • VOx – Grown from V2O3 target, Tunable oxidation state
  • Metals
  • Other oxides (Fe3O4, etc)
  • Doping and alloy growth (using the cluster)

Inorganic Molecular Beam Epitaxy (MBE)

  • 3 Knudsen cells
  • 2 e-beam PVD
  • LEED
  • 10-11 torr base pressure
  • Ultra pure growth
  • Temperature range: cryogenic to 1000 C

Organic Molecular Beam Epitaxy (MBE)

  • 10-10 torr base pressure
  • 1 Knudsen cell + 2 e-beam guns
  • 4 Knudsen cells (phthalocyanine)
  • Mechanical masks and manipulator for in-situ device fabrication


Bulk Synthesis

  • Glove box in Ar atmosphere
  • Ovens with variable gas flow (up to 1100 C in O2, Ar, N2, Ar/H)
  • Press up to 100 MPa
  • Ball mill


Clean Room (in-lab)

  • Spinner/etc for resist preparation
  • UV lithography (mask aligner)
  • HF/other etch processes

Characterization

Electric transport – Closed Cycle Cryostats

  • Cold finger/vacuum cryostats
  • Up to 1 Tesla field
  • Optical windows
  • T range 10 K to 400 K
  • DC electric measurements


Dynacool PPMS

  • Transport/VSM
  • T range: 1.6 to 400 K, transport to 1000 C
  • H range: – 9 to 9 T
  • Hydrostatic pressure measurements (transport) up to 3 GPa

Magnetism – Magnetic Field Modulated Microwave Spectroscopy (MFMMS)

  • Modified EPR for ultrasensative EM phase transition search
  • Superconducting transition sensitivity 10-12 cm3
  • T range: 4K to 300 K. H range: -100 Oe to 10000 Oe
  • X-band EPR and FMR

X-ray Diffractometry

  • Rotating anode (Bruker) and tube (Rigaku) X-ray sources
  • Bruker: 6 axis goniometer, RT to above 100 C
  • Rigaku: 4 axis goniometry, 110 K to RT


Lakeshore TTPX probe station

Keithley 6221 current source
Keithley 2182A nanovoltmeter

Gas Evolution System

  1. Gas evolution system:
  2. Annealing furnace with gas pressure monitoring capabilities
  3. Base pressure: 10-7 torr
  4. T range: RT to 1000C
  5. P control: 10-7 torr to 1000 torr
  6. RGA measurement
  7. TPD measurement

Conclusion

  • Diverse growth and characterization capabilities
  • We are in process of acquiring high frequency measurement system
  • Interested in collaborations
  • Unique growth
  • Unique characterization